Blech strip test structure

Algorithm implemented by UniPro and based on FEM is applied for the simulation of a material edge displacement in the Blech short strip test structure.
In this structure a short segment is deposited on a strip of higher resistivity diffusion barrier material such as . In fact segments are "suffering" of the electromigration processes in this "pie", because the electrical current passes mainly through the due to its much lower resistivity.

• diffusion barrier is domain
  
• strip is domain
  

Values in micrometers